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How Siemens EDA is using the TSMC 3Dblox standard to change 3DIC verification
By John Ferguson In recognition of the growing need for a more holistic approach to three-dimensional integrated circuit (3DIC) design, TSMC introduced their 3DFabric™ technologies in 2020 to incorporate system design, 3D stacking, and their advanced packaging technologies, such as TSMC-SoIC™, InFO, and CoWoS®. That was quickly followed by the formation of the TSMC Open Innovation Platform® (OIP) 3DFabric Alliance to accelerate 3DIC ecosystem innovation and readiness even fur
Apr 25, 20233 min read


The secret superpower of early design verification
By Kesmat Shahin How many times, as you traversed across design stages and ran countless iterations, have you wished that you had a superpower to let you accomplish 100 things at the same time? Oh, and maybe a magic wand, so you could find and fix just actionable errors without even debugging? Unfortunately, superpowers and magic wands are pretty hard to come by in integrated circuit (IC) design, but with Calibre nmLVS Recon early design layout vs. schematic (LVS) checking, S
Apr 18, 20232 min read


Aegis Software’s Latest Updates to the FactoryLogix MES Platform Enable Unmatched IIoT from Both Hum
Horsham, PA (March 30, 2023) — Aegis Software, a global provider of Manufacturing Operations Management Software, announces new...
Apr 11, 20233 min read


恩萊特科技榮獲「台灣電機電子優良中小企業」肯定
台灣電機電子優良中小企業由TEEMA 協同商務創新委員會針對「智慧物聯網」、「電子零組件」、「消費性電子產品」及「其他電機電子」產業之中小企業進行推廣,將甄選 40 家產業中持續精進與不斷創新的優良廠商,作為台灣優良企業形象及產業模範。...
Dec 26, 20221 min read


【半導體趨勢論壇 從晶片設計到智慧製造】圓滿落幕
「半導體趨勢論壇 從晶片設計到智慧製造」於2022年12月15日圓滿落幕,此次活動由恩萊特科技主辦,Siemens EDA 及南港 IC 設計育成中心協辦。 開幕儀式上由恩萊特科技蘇正宇總經理致歡迎詞並介紹貴賓,緊接著由 Siemens EDA Eddy Lu...
Dec 16, 20221 min read


晶片驗證速度再進化 西門子EDA Calibre研討會重磅回歸
隨著半導體先進製程的技術不斷向前推移,晶片設計的挑戰性不斷提高,貿易戰對全球產業供應鏈等衝擊,電子設計自動化(EDA)工具領導供應商西門子EDA,為協助使用者獲得最即時、最專業資訊,於11月底在新竹國賓大飯店舉辦睽違近2年的「Siemens EDA Calibre Day...
Dec 9, 20224 min read


2022 L-Edit 進階實務 Workshop 圓滿成功
本周一(11/14)的 L-Edit 進階實務 Workshop 2022,為恩萊特科技的客戶進行 L-Edit 環境架構以及相關功能的介紹。 除了功能的操作之外,也透過實務案例針對 DRC Set Up、TDB Layout vs Layout Comparison、Docking Views、Wire Utilities 和 Mask Bias 等相關範例作介紹,加深學員們對 L-Edit 的了解,協助解決專案問題提升設計效率! 課程結束後,也獲得客戶們許多正面回饋 「今天講師講了很多小技巧,以及不知道的功能,對工作上提高非常多方便度」 「有初階的課程希望也有機會參加」 「非常完善!真是感謝!」 您也想參加 L-Edit Workshop 增加實務應用經驗值嗎? 歡迎與我們聯絡,了解更多詳情! 恩萊特科技股份有限公司 Enlight Technology Co., Ltd. www.enlight-tec.com 300052 新竹市東區關新路27號14樓之1 電話:03-602-7403 傳真:03-563-0016 sales@enlig
Nov 17, 20221 min read


“How-To” OptiInstrument — Automation of EXFO CTP-10 Equipment for Remote Testing
This video demonstrates the remote communication and control of EXFO CTP-10 to set its operating conditions to measure a device under...
Nov 15, 20221 min read


“How-To” OptiInstrument — IL Measurement of 4-Ch DEMUX
This video demonstrates measuring remotely the intensity of 4-Ch DEMUX using a Broadband source hosted in EXFO LTB-8 equipment and...
Nov 8, 20221 min read
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