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Accelerating IC design time to market with Calibre in the cloud
By Michael White When you’re flying, it’s fun to look out the window and see clouds from “the other side.” When you’re running an IC...
Jun 21, 20222 min read


以EDA創新為基,促進半導體產業進程
作者 : 潘志豪,西門子EDA亞太區Calibre首席應用工程師 EDA業者正與IC設計公司、晶圓代工廠攜手,因應由摩爾定律(Moore’s Law)發展帶來的各項挑戰,例如使用FinFET和GAA FinFET產生的效能、可擴展性和變化彈性等問題尚未完全解决。自22nm節...
May 31, 20227 min read


寬能隙元件技術暨未來應用趨勢線上研討會
恩萊特科技贊助「寬能隙元件技術暨未來應用趨勢線上研討會 」,與業界專家共同探討寬能隙元件的關鍵技術與未來應用,邀您一同參與。 活動時間 2022年05月26日 10:00 a.m.(台北時間) 研討會簡介 近期引起眾多話題的寬能隙(WBG)元件...
May 19, 20222 min read


The “next” technology node: ready or not, here it comes
By Shelly Stalnaker For years, decades even, the semiconductor industry has lived by the process node, which was originally named by its...
May 17, 20222 min read


TOREX uses Siemens EDA tools to satisfy IC requirements and shorten design cycles
Using Tanner design tools, TOREX has developed the smallest converters possible without sacrificing functionality and performance....
May 3, 20224 min read


Tanner 應用系列|適合類比 / 混合訊號 IC 設計的全流程解決方案
Siemens EDA IC 全流程 Siemens EDA 全流程有一個豐富的環境,高度可配置且非常靈活,為混合信號設計人員提供了許多易用功能。該流程經過優化,適用於創建 22nm 的定制模擬 IC 或 “類比為頂層” 的混合訊號...
Apr 26, 202211 min read


What’s New in Tanner Tools v2021.2?
Improved Handling of Array Creation and Spacing in L-Edit Using Alignment Operations Tile2DArray icon now controls rows/columns when all...
Apr 11, 20223 min read


Learn the secret to generating signoff fill in P&R and accelerating your tapeouts
By Srinivas Velivala Place and route (P&R) engineers are always on the lookout for ways to optimize their design flows to ensure designs...
Apr 5, 20222 min read


A Powerful Analog Verification Platform for Samsung Foundry’s Advanced Technologies
By Pradeep Thiagarajan Having done IC development for over two decades, I can appreciate the complexities of foundry processes that...
Mar 29, 20224 min read
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